Abstract

A plasma filament ion source has been developed as a long lived ion source for use in ion implantation and deposition. In this ion source, a plasma filament serves as a cathode in place of a thermionic tungsten filament such as used in the Freeman ion source. The lifetime of this ion source was found to be 45 h with a P + ion current of 2 mA. A stable As + ion current of 9.1 mA and O + ion current of 2.5 mA can be obtained. The running test results of this ion source applied to the implanter are reported in this paper.

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