Abstract
Multiferroic BiFe0.95Mn0.05O3 (BFMO) epitaxial thin films were grown on SrRuO3, SrTiO3 and TiN-buffered (001)-oriented Si substrates under different oxygen pressure by pulsed laser deposition. The influence of oxygen pressure on the microstructures, domain configurations and their local piezoresponse and electrical behaviors were investigated by the piezoresponse force microcopy and conductive atomic force microscopy. BFMO thin film at low oxygen pressure was found to demonstrate pure phase state, inhomogeneous piezoresponse and low leakage behavior with diode-like behavior, while high oxygen pressure leads to impurity Bi2O3 phase-enclosed BFMO films with higher leakage current above 2 nA, revealing the importance of the oxygen pressure in governing the physical properties of BFMO films.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
