Abstract

Metal electrode structures for biosensors with a high spatial density and nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writingof poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimalproximity exposure and straight proton trajectories in ( nm) resist layers for focused MeV proton beam writing are strongly indicativethat ultimate electrode gap widths approaching a few nanometres are achievable.

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