Abstract
A series of 2D MoS2 nanosheet films are fabricated on Mo‐coated alumina ceramics using a vacuum electron beam vapor deposition technique. It is found that both the crystallographic orientation and the thickness of the films can be controlled well by changing the processing conditions. It is demonstrated that the thickness of the deposited MoS2 films has a direct effect on their microtopographies and field emission characteristics. For each MoS2 film, its field emission performance increases first with an increase in thickness and subsequently decreases in the examined thickness range; the best film thickness is 15 nm. All the experimental results are explained in detail.
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