Laser plasmochemical synthesis of hard protective SiCN films

Abstract

A new method of laser plasma deposition had been applied to synthesise the silicon carbonitride (SiCN) coatings on stainless steel substrates and cutting devices using hexamethyldisilazane Si2NH(CH3)6 as a precursor. The precursor vapours were activated by powerful optical pulsating discharge in a high velocity gas stream (Ar). Characterisation of the films has been carried out by complex methods. The deposited coatings are amorphous, uniform in thickness and decorate surfaces of different engineering materials quite well. The nanohardness of SiCN coatings was estimated as 15–24 GPa.