Large-scale, nonsubtractive patterning of transparent conducting oxides by ion bombardment

Abstract

While significant progress has been achieved in the fabrication and performance of transparent electronic devices, substantially less research effort has been devoted to transparent interconnects, despite their critical importance for transparent integrated circuitry. Here, we exploit the crystal disorder induced by Ar+ ion bombardment to achieve efficient fabrication of electrically conductive patterns on indium oxide surfaces. The resulting ion-induced patterns are characterized by conductive atomic force microscopy, secondary ion mass spectrometry, and four-point charge transport measurements. Massively parallel patterning is demonstrated over square centimeter areas with a patterned electrical conductivity of ∼104 S cm−1.