Abstract
Hexagonal arrays of nanoscale holes or metal dots (25nm in diameter and 39nm in period), with orientational order extending over the entire square-centimeter array area, were fabricated on unpatterned silicon wafer substrates using a shear-aligned sphere-forming diblock copolymer template. Since two or more layers of spherical nanodomains are required to achieve alignment in the block copolymer film, but pattern transfer requires a single layer, a multistep etching process was developed, whereby the top layer of a shear-aligned bilayer was evenly removed, leaving the ordered bottom layer as the fabrication template for hole and dot arrays free from grain boundaries.
Published Version
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