Abstract
We report a method to fabricate high-quality patterned magnetic dot arraysusing block copolymer lithography, metal deposition, and a dry lift-off technique.Long-range order of cylindrical domains oriented perpendicular to the substrate andin hexagonal arrays was induced in the block copolymer films by prepatterningthe substrate with topographic features and chemically modifying the surfaceto exhibit neutral wetting behaviour towards the blocks of the copolymer. Theuniformity of the domain size and row spacing of block copolymer templates created inthis way was improved compared to those reported in previous studies that usedgraphoepitaxy of sphere-forming block copolymers. The pattern of block copolymerdomains was transferred to a pattern of magnetic metal dots, demonstrating thepotential of this technology for the fabrication of patterned magnetic recordingmedia.
Published Version
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