Abstract
The process of reduction of the surface of higher oxide Ta2O5 under irradiation by inert gas (Ar+) and chemically active gas (O2+) ions with an energy of 3 keV in high vacuum is investigated by X-ray photoelectron spectroscopy at room temperature. It is found that intermediate oxide TaO2, lower oxide TaO, and metallic Ta form in the surface layers of Ta2O5 under Ar+ ion bombardment. An insignificant amount of intermediate oxide TaO2 forms in the surface layers of Ta2O5 under O2+ ion bombardment. Ion-beam-induced reduction of the Ta2O5 surface is shown to depend on the type of ion and irradiation dose.
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