Abstract
Ion beam assisted deposition (IBAD) is a coating technique which combines a thin-film deposition method such as evaporation with irradiation by highly energetic ions from an ion source. Application of an ion source and a vapor source which are operated independently of each other render the IBAD technique highly controllable, reproducible, and flexible. Ion flux, atom flux, ion energy, ion impact angle, and other parameters can be controlled independently over a wide range. In order to take advantage of the beneficial features of this technique and obtain optimum process conditions ion sources with special properties are required. In this article different ion source types and equipment which has been used for IBAD to-date are presented and their special features discussed. Ion sources which should be applicable for IBAD are described. Finally, general requirements of IBAD ion sources are discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
