Abstract
SummaryThe term “ion plating” is applied to atomistic deposition processes in which the substrate is subjected to a flux of high energy ions, energetic neutrals, and active species sufficient to cause sputtering before and during film deposition. The ion bombardment can be done in an inert, reactive or mixed gas radio-frequency discharge system where the substrate is made a discharge electrode. The principal benefits obtained from the ion plating process are: (a) achievement of very good adhesion between the deposited metal film and the plastic, (b) capability of coating uniformly plastic items of complex shapes with highly adherent layers, and (c) high rates of deposition can be achieved even for the deposition of metal compounds like oxides, nitrides and carbides. In this context ion plated metal and metal oxide films have been prepared on Melinex and PES by induction heating and magnetron sputtering. The optical, electrical and mechanical properties of these films have been examined.
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