Abstract
This review discusses some of the issues that will govern future commercial adoption of ion beam nanoscale fabrication and lithography, with special reference to some major fields of application. Selected recent research advances are highlighted, as they indicate new experimental successes, new insights into complex ion interaction mechanisms, and a fast evolving variety of advanced instrumentation and fabrication resources. It is evident that robust fabrication involving few-nanometer features will be enabled by strategic applications of ion beams, especially if they can be coupled with directed self-assembly.
Full Text
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call