Abstract
AbstractNanodiamond (ND) and carbon nanotube‐diamond (CNTD) nanocomposite films are synthesized on silicon(100) substrates, discharging hydrogen‐based gas mixture (methane and hydrogen), using radio frequency plasma‐enhanced (RF‐PE)CVD. Substrate pretreatment conditions are examined for enhancing microdiamond (MD), ND, CNTD nanocomposite, or carbon nanotube (CNT) nucleation. Well‐faceted MD with a low nucleation density, on a silicon substrate, is achieved using a solution of NaOH in water to roughen the silicon substrate, while ND, CNTD nanocomposite, and CNTs are acquired using Co(NO3)2/Mg(NO3)2.6H2O or Fe(NO3)3.9H2O/Mg(NO3)2.6H2O or Ni(NO3)2.6H2O/Mg(NO3)2.6H2O solution in alcohol dripped onto the silicon substrate, which means that pretreatments have a significant influence on grain size, nucleation density, and microstructure of the obtained films. The growth mechanisms for ND and CNTD nanocomposite are discussed.
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