Abstract
The low-current anodic vacuum arc has been utilized to deposit type 303 stainless steel thin films. The stoichiometry of the deposited films was found to be independent of the film thickness. The stoichiometry of the deposited film approached that of the source material as the arc current increased and was indistinguishable from that of the source material value for arc currents above 80 A. In addition, the stoichiometry of the deposited film approached that of the source material as the angle between normal to the anode surface and the substrate was decreased, again being indistinguishable from that of the source material for angles of less than 45°. The stoichiometry of the deposited films was found to be independent of the thickness of the film.
Published Version
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