Abstract
The structural properties of the methylsilsesquioxane (MSQ) based mesoporous low dielectric constant (low- k) film JSR LKD have been characterized by specular X-ray reflectivity (SXR) and small angle X-ray scattering (SAXS). Using SXR, the as cured LKD material was found to have a mass density of 0.996 g/cm 3 and an estimated porosity of 54%. From SAXS, the typical pore size was determined to be 2.5 nm. However, larger pores with diameter of ∼13 nm were also deduced to be present. Structural changes in LKD after isochronal annealing in nitrogen and oxygen plasma treatment were studied by SXR. The density of LKD films decreased with annealing temperature up to 400 °C and a single layer model was adequate for SXR fitting. For annealing above 500 °C and for oxygen plasma treatment, a bilayer model consisting of a denser upper layer and a bottom layer was necessary for data fitting. The mechanisms behind the development of this bilayer structure are discussed and compared with reference to Fourier transform infrared (FTIR) spectra.
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