Abstract

In this paper, specular X-ray reflectivity (SXR), small angle X-ray scattering (SAXS) and ion beam analysis (IBA) have been used for the quantitative structural characterization of a proprietary MSQ based porous dielectric material, JSR LKD-5109 with dielectric constant k=2.2. Parametric structural models of the LKD films have been developed for the analysis of both SXR and SAXS data. SXR measurements were performed using a Siemens D5005 X-ray diffractometer equipped with a reflectivity sample stage. Transmission SAXS measurements were conducted using a Bruker AXS Nanostar small angle scattering instrument.

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