Abstract
The Photoelectron Emission Microscope (PEEM) and Low Energy Electron Microscope (LEEM) are parallel-imaging electron microscopes with highly surface-sensitive image contrast mechanisms. In PEEM, the electron yield at the illumination wavelength determines image contrast, in LEEM, the intensity of low energy (< 100 eV) electrons back-diffracted from the surface, as well as interference effects, are responsible for image contrast. Mirror Electron Microscopy is also possible with the LEEM apparatus. In MEM, no electron penetration into the solid occurs, and an image of surface electronic potentials is obtained.While the emission microscope techniques named above are not high resolution methods, the unique contrast mechanisms, the ability to use thick single crystal samples, their compatibility with uhv surface science methods and new material-growth methods, coupled with real-time imaging capability, make them very useful.These microscopes do not depend on scanning probes, and some are compatible with pressures up to 10-3 Torr and specimen temperatures above 1300K.
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