Abstract
The high affinity of O, N, and C with α-Ti has a serious detrimental influence on the high-temperature properties of these alloys, promoting the formation of α-case. These elements dissolve in interstitial sites and diffuse very fast in α-Ti (10(3)-10(8) times higher than the self-diffusivity of Ti) at high temperature accelerating the growth of α phase surface layer. Understanding the diffusion mechanisms of these elements is crucial to the design of high-temperature Ti alloys. This work aims to determine the stable interstitial sites and migration paths of O, N, and C in α-Ti. Diffusion coefficients were evaluated applying an analytical model, the multi-state diffusion method, and kinetic Monte Carlo simulations informed by first-principles calculations. The results show the reliability of these two methods with respect to the experimental data. In addition to octahedral sites, less traditional interstitial sites are shown to be stable configurations for these elements instead of tetrahedral sites. This requires to update the transition pathway networks through which these elements have been thought to migrate in α-Ti.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.