Abstract
X-ray diffraction, photoemission, and Auger electron spectroscopy studies are reported of the interactions between the interface of titanium and C60 solid film during low-temperature annealing. The structure of C60 at the Ti/C60 interface is disrupted by the Ti atoms when Ti is deposited onto the surface of C60 film. Titanium atoms react with carbon atoms to form amorphous Ti carbide during low-temperature annealing. This interaction is related to the solid state amorphization reaction of the deposited Ti layer with C60 film, which occurs with a driving force of a negative heat of formation in the Ti–C system and a dominant diffusion of carbon into the Ti overlayer.
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