Innovation II - The development of the Epsilon epitaxy reactor, 1982-1988

Abstract

In a period of financial, geographical, and technological expansion, ASM started an unique development project for a new epitaxial reactor in 1982. The result of this development, the Epsilon reactor, redefined traditional epitaxial production technology used in semiconductor manufacturing. The Epsilon reactor changed the epitaxy technology by processing one wafer at a time – a single wafer process – instead of multiple ones simultaneously in a batch. The innovative machine was a success, conquering 45 percent of the market after its introduction, enabling new innovative processes, and being produced to this day. Moreover, unique for ASM, this reactor was developed from scratch. Rather than commercializing an external invention, as ASM was used to do, this process also comprised the invention of the machine’s chemical and mechanical processes.