Abstract
Abstract Pyrometric interferometry has been performed in the formation of diamond crystals and films synthesised on pretreated single silicon substrates by a microwave plasma assisted chemical vapour deposition (MPCVD) technique. The growth mode of this material induces particular variations of the emissivity ratio e / e 0 that we are able to simulate theoretically, taking into account the nucleation mode (Volmer-Weber), the nucleation density N and the growth rate v of the diamond crystallites. The comparison between the experimental and the theoretical curves of the e / e 0 variations allows us to understand better the first stage of the CVD diamond formation in terms of kinetic and nucleation density. Finally, the real-time monitoring of these parameters is a very attractive objective for the precise control of the deposition process, for which the first stages are crucial for the subsequent diamond film quality.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call