Abstract

Ta 2 O 5 films deposited on Si substrates were investigated using transmission Fourier-transform infrared spectroscopy. We found a new absorption peak at 2340 cm−1 that can be characterized as a stretching vibration mode due to Ta=O bonds in the films. This peak appeared following annealing in O2 ambient, but not in N2 ambient. It was located at 2335 cm−1 in amorphous Ta2O5 films and shifted to 2340 cm−1 after crystallization by annealing at over 700 °C. The bonds associated with the peak were homogeneously distributed in the film. We demonstrated that Ta2O5 films can include strong double bonds between Ta and O (Ta=O) in the structure, independent of whether they are crystalline or amorphous.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call