Influence of underlayer roughness on the properties of Sc0.4Al0.6N thin films prepared via sputter deposition

Abstract

Abstract A ScAlN thin film is one of the key materials of MEMS and high-frequency filters used in new-generation communication devices. Piezoelectricity can be improved by increasing Sc concentration. However, abnormal grains often appear at high Sc concentrations, degrading crystallinity and piezoelectricity. Herein, we demonstrated that underlayer roughness considerably affects the emergence of abnormal grains in a Sc0.4Al0.6N thin film formed via reactive DC sputtering. Dry etching with Ar plasma can effectively reduce the surface roughness of amorphous SiN and polycrystalline Si. Sc0.4Al0.6N thin films deposited on amorphous SiN and polycrystalline Si with sufficient flat surfaces exhibited a low density of abnormal grains, high crystallinity and piezoelectricity, and low loss tangent. Moreover, such high-quality thin films were obtained on a borophosphosilicate glass flattened using a reflow process without Ar etching. Therefore, underlayer roughness played an important role. The findings can help enable the large-scale production of highly doped ScAlN thin films.