Abstract
We have investigated the influence of the microstructure and chemistry of the surrounding host on the strong visible photoluminescence (PL) from silicon nanoclusters (nc-Si) embedded in three different silicon-based dielectric compounds: SixNy:H,Cl, SixNyOz:H,Cl, and SixOz:H,Cl, obtained from silicon nitride films deposited by SiH2Cl2∕NH3∕H2 plasma-enhanced chemical vapor deposition at different growth pressures. A blueshift is found in the PL coming from the nc-Si as the content of oxygen in the surrounding host is increased, and a significant improvement in PL intensity is achieved when the nc-Si are well passivated with O instead of H. We discuss the PL behavior in terms of the quantum confinement model and passivation state of the nc-Si surface.
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