Influence of plasma parameters on low-k SiCOH film grown by plasma-enhanced chemical vapor deposition using dimethyldimethoxysilane

Abstract

Here, we report the influence of the electron density and the electron temperature on the reduction of dielectric constant in the SiCOH thin film using dimethyldimethoxysilane (DMDMS) as a function of pressure. The measured electron density and electron temperature decreased as increasing the pressure. The decrease in the measured electron density with increasing pressure can be attributed to local electron kinetics. Moreover, the decreasing electron temperature is caused by increased inelastic collisions between electrons and neutral species in the chamber. It is identified that CH3 radicals are less dissociated from DMDMS molecular at higher pressure by a quadrupole mass spectroscopy. As increasing pressure, the increase of the Si–CH3 bonds in SiCOH thin films is confirmed by Fourier transform infrared spectroscopy. As a result, the dielectric constant and refractive index of the SiCOH films are reduced at low electron density and electron temperature.