Abstract
ABSTRACTThe influence of magnetic field on Plasma parameters of ECR plasma were measured by the Langmuir probe technique. And it was shown that the plasma parameters can be controlled by magnetic field. Amorphous silicon films were prepared by ECR plasma CVD method under various magnetic field conditions for the purpose to investigate the effect of plasma density and energy on the property of amorphous silicon films. High plasma density improved the photoconductivity of amorphous silicon but the optical gap and activation of dopant depended on the substrate temperature rather than plasma density.
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