Abstract
La 0.7Sr 0.3MnO 3 (LSMO) films of variable thickness were deposited by magnetron sputtering on a LaAlO 3(1 0 0) substrate. The substrate–film lattice mismatch causes changes in the microstructure and magnetoresistance. The film structure is characterized by XRD. The substrate–film lattice mismatch is compensated by large stress in the LSMO layer at interface. With increasing film thickness this stress relaxes and the upper film layer exhibits bulk value lattice parameters. It was shown that deposition conditions also influence film stress. Due to variable strain in the thin LSMO films, different magnetoresistive behaviour has been found. The sample with the lowest thickness of 10 nm showed semiconducting behaviour. Epitaxial LSMO films of thickness 20 nm< d<215 nm exhibit a high Curie temperature up to T C∼365 K and colossal magnetoresistance behaviour. A highly stressed film with a metal–insulator transition at ∼160 K showed both high negative magnetoresistance at T=150 K and marked high positive magnetoresistance at T<50 K.
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