Influence of MEEF change on the mask shadowing effect in extreme ultraviolet lithography

Abstract

The influence of mask error enhancement factor (MEEF) on the mask shadowing effect was investigated for extreme ultraviolet lithography. Imaging properties including horizontal–vertical (H–V) CD (critical dimension) bias and MEEF change through the pitch according to absorber thickness and process condition were studied using aerial image simulation. The mask structure used in this study consisted of tantalum nitride (TaN) absorber and 2 nm ruthenium (Ru) capping layer on the 40 pair of Mo–Si multilayer. As the absorber thickness increased and the pattern pitch decreased, both H–V CD bias and MEEF increased. At the illumination condition of 0.32 numerical aperture (NA), the H–V CD bias variation through the pitch was negligible and slightly increased at 1:1 pitch, while it steeply increased at 1:1.2 and 1:1 pitch for NA of 0.25. The MEEF value was below 1.5 for all calculated absorber thicknesses when the pitch was from 1:1.2 to 1:5, whereas it was 3 with 64 nm thick TaN for 1:1 pitch at vertical pattern. With the increment of absorber thickness, the MEEF difference between the horizontal and vertical pattern increased. We also calculated the H–V overlapping process window (PW) according to TaN thickness using 22 nm 1:1 line and space (L/S) pattern. As absorber thickness decreased, the overlapping zone in the EL of the focus–exposure plots between the horizontal and vertical features increased. Enough image contrast and H–V overlapping PW could be achieved by applying 38 nm thick TaN.