Influence of Deposition Conditions on Properties of Ta2O5 Films Deposited by Ion Beam Sputtering Coating Technique

Abstract

Investigation of deposition conditions on structural, optical, and surface properties of Tantalum pentaoxide (Ta2O5) thin films deposited without assisted ion beam (Single Ion Beam Sputtering technique, SIBS) and with assisted ion beam (Dual Ion Beam Sputtering technique, DIBS) is carried out. For both SIBS and DIBS identical coating process conditions are applied for deposition of Ta2O5 films onto highly polished and clean, fused silica substrates. Estimation of deposition rates of Ta2O5 with identical beam energies and coating chamber conditions is done. Benefits of O2 assist beam on the behavior of structural, optical, and surface properties of thin films deposited are studied. The films are characterized with an ellipsometer, optical profilometer, XRD, FE-SEM, and XPS techniques to bring the merits films coated of Ion Beam Sputtering deposition with and without assist Ion Beam. Configuration of ion sources and targets in the coating chamber for DIBS of oxide targets is carried out in the present work are useful for multi-layer coatings for high reflectivity mirrors for electro-optical instruments like ring laser-based rotation sensors.