Abstract
We report on the improvement in efficiency of deionized water rinsing after using a H2SO4/H2O2/HF mixture which produces hydrophobic Si surfaces by means of fluorine passivation, providing better sulfur removal and shorter rinsing time than the conventional H2SO4/H2O2 mixture. After removing this passivation agent by rinsing in deionized water, the surfaces are still covered with chemical oxide, which protects them from organic contamination. Furthermore this treatment does not induce surface roughening.
Published Version
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