Abstract
To improve the low field magnetostrictive response of TbFe sputtered films, the effects of slow rate and rapid rate thermal annealing on the magnetic and magnetoelastic properties of the films were investigated. The annealing was achieved for amorphous TbFe films with the composition around 40 at.% Tb, because these films simultaneously exhibit relatively soft inplane magnetization and considerably large magnetostriction. The present work shows that thermal annealing is very effective for improving the low field magnetostrictive response of a film, for example, the engineering magnetostriction of amorphous Tb/sub 40/Fe/sub 60/ film at 500 Oe became 5.1 times larger by annealing from 46/spl times/10/sup -6/ to 235/spl times/10/sup -6/.
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