Improved purity of long-wavelength InAsSb epilayers grown by melt epitaxy in fused silica boats

Abstract

In this study, we first present the process of the melt epitaxial (ME) growth method, and the improvement of low-temperature electron mobility of the long-wavelength InAsSb epilayers grown by ME in a fused silica boat. The electrical properties were investigated by van der Pauw measurement at 300 and 77 K. It is seen that the electron mobility of the InAsSb samples grown by graphite boat decreased from 55,700 to 26,600 cm 2/V s when the temperature was reduced from 300 to 77 K, while for the samples grown by fused silica boat, the electron mobility increased from 52,600 at 300 K to 54,400 cm 2/V s at 77 K. The electron mobility of 54,400 cm 2/V s is the best result, so far, for the InAsSb materials with cutoff wavelength of 8–12 μm at 77 K. This may be attributed to the reduction of the carbon contamination by using a fused silica boat instead of a graphite boat.