Abstract
Pb(Zr0.52Ti0.48)O3 (PZT) perovskite ferroelectric thin films were fabricated on LaNiO3 buffer silicon substrate by sol–gel spin coating technique. The thickness of PZT films was about 150 nm, and the thickness of LNO films as electrodes was about 120 nm. The prepared PZT thin films were annealed by hot plate annealing and conventional electric furnace annealing at various temperatures for 30 min. The microstructure of annealed films was analyzed by different techniques. The obtained results demonstrated that the perovskite phase can be achieved in films by both methods of annealing. Structural and morphological characterizations substantiated that hot plate annealing method can facilitate the formation of perovskite phase of PZT films than the electric furnace annealing. Consequently, the films annealed using hot plate exhibited more excellent electrical properties. The higher dielectric permittivity, remnant polarization, and the lower dielectric dissipation were observed for the thin films annealed at 550 °C by the hot plate. The values of remnant polarization and coercive field of PZT annealed on the hot plate were 36.4 μC/cm2 and 168 kV/cm, respectively. These results demonstrated that the crystallization of ferroelectric PZT films was improved by hot plate annealing.
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