Abstract
We report the improved crystalline and optical quality of GaN film overgrown by hydride vapor phase epitaxy adopting a molybdenum (Mo) nanoisland mask (MNM). The MNM is fabricated following thermal annealing of the nanometer-thick Mo film deposited by electron-beam evaporation. The full width at half maximum values of high-resolution x-ray diffraction (HRXRD) rocking curves for the GaN film with MNM are 188arcsec (002 reflection) and 219arcsec (102 reflection), while those for the GaN film without MNM are 256 and 364arcsec, respectively. This result indicates a significant reduction of dislocation density in the overgrown GaN film with MNM. Photoluminescence spectra measurements reveal the compressive strain relaxation and improvement in the quality of the overgrown GaN film with MNM as compared to the regrown GaN film without MNM, which is consistent with the trend observed by HRXRD.
Published Version
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