Abstract
We report a technique to prepare top and bottom oxide electrodes of LaNiO3 (LNO) for lead zirconate titanate (PZT) films using a chemical solution deposition. LNO/PZT/LNO sandwich structures were prepared on platinized silicon by spin coating combined with rapid thermal annealing. Pt dots were sputtered on top of LaNiO3 film to serve as protective masks during etching of the uncovered LaNiO3 layer using dilute hydrochloric acid. For comparison, Pt/PZT/Pt capacitors were also prepared using the same processing conditions. Electrical measurements were carried out on both Pt/LNO/PZT/LNO/Pt and Pt/PZT/Pt structures. The remnant polarizations and coercive fields for these two capacitors are 17.4 and 21.4μC∕cm2, 71 and 81.5kV∕cm respectively at 5V. The leakage current density for the Pt/LNO/PZT/LNO/Pt structure is about 1.38×10−6A∕cm2 at 5V, which is lower than that of PZT deposited on Pt electrode. After 109 bipolar switching cycles, no significant change in remnant polarization was observed in the Pt/LNO/PZT/LNO/Pt capacitor, in comparison to the Pt/PZT/Pt capacitor which lost more than 50% of its original remnant polarization.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
