Abstract
Abstract Multilayers of relaxor ferroelectric (Pb0.92La0.08Zr0.52Ti0.48O3) and antiferroelectric (Pb0.96La0.04Zr0.98Ti0.02O3) thin films were fabricated on Pt/Ti/SiO2/Si substrates by Chemical Solution Deposition (CSD) method. The properties of the independent relaxor ferroelectric (RFE denoted as R) and antiferroelectric (AFE denoted as A) thin films were compared with their various stack configurations made by alternatively coating the R and A layers in the patterns of R/A, R/A/R, R/A/R/A/R/A, A/R, A/R/A, and A/R/A/R/A/R. The crystallographic studies confirmed the coexistence of both RFE and AFE phases in the multilayer stacks which was further verified by electrical characterizations. The multilayer stack showed improved power density (PD), energy efficiency (η), and reduced dielectric loss compared to individual R and A films. Among all the multilayer configurations, the stack with A/R/A/R/A/R layer exhibited significant improvement in energy efficiency (94%) which is higher than the reported results so far on multilayer structures.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
