Abstract
In this paper we discuss atomistic Monte Carlo simulations of thin film microstructure evolution. We discuss physical vapor deposition, and are primarily concerned with the nucleation and coalescence of three-dimensional islands and their effect on film morphology. We discuss some fundamental issues associated with thin film formation, together with an assessment of the sensitivity of the film morphology to the deposition conditions and materials properties. In order to allow rapid assessment of the deposition conditions, we propose a simple analytical model that retains most of the essential physical parameters and properties.
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