Abstract
We use dimeric arsenic (As2) or tetrameric arsenic (As4) during molecular beam epitaxy to manipulate the structural and optical properties of GaAs(111)A tensile-strained quantum dots (TSQDs). Choice of arsenic species affects nucleation and growth behavior during TSQD self-assembly. Previously, epitaxial GaAs(111)A TSQDs have been grown with As4, producing TSQDs with a triangular base, and ‘A-step’ edges perpendicular to the three directions. We demonstrate that using As2 at low substrate temperature also results in triangular GaAs(111)A TSQDs, but with ‘B-step’ edges perpendicular to the three directions. We can therefore invert the crystallographic orientation of these triangular nanostructures, simply by switching between As4 and As2. At higher substrate temperatures, GaAs(111)A TSQDs grown under As2 develop with a hexagonal base. Compared with triangular dots, the higher symmetry of hexagonal TSQDs may reduce fine-structure splitting on this (111) surface, a requirement for robust photon entanglement. Regardless of shape, GaAs(111)A TSQDs grown under As2 exhibit superior optical quality.
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