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https://doi.org/10.1117/12.950154
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Cite Publication Date: Apr 26, 1989 |
 Citations: 1 |
Affiliation: Universität Hamburg
Holographic generation of gratings with periodicities down to 140nm in thin polymethyl methacrylate (PMMA) layers on Si-substrates using a narrow band KrF-excimer laser (λ=248 nm) is reported. At low single pulse energy densities ( 70mJ/cm2) we directly write gratings in the PMMA by photoetching (ablation).
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