Abstract

A narrow band KrF excimer laser system for lithography has been developed. Its durability has been proved up to 2 billion shots that correspond to one year operation in mass production line. The system has kept the average power of 6W with the power stability within +- 3% and the spectral line-width 1.2 pm (FWHM) with the wavelength stability within +- 0.2 pm. The integration of the spectrum has indicated that 95% of the spectral energy lay inside 4.6 pm band during 2 billion shots

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