Abstract

This paper presents a theoretical model of the holographic formation of photon structures (PS) in a photopolymer material (PPM) by Bessel-like and Gaussian light beams, taking into account the self-diffraction of recording light beams in areas of low contrast of the interference pattern. It was demonstrated by numerical simulation and experiment that the influence of the self-diffraction effect leads to an increase in the level of the side maxima of the diffracted light beam.

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