Highly Sensitive Gate/Body-Tied P-Channel Metal Oxide Semiconductor Field Effect Transistor-Type Photodetector with an Overlapping Control Gate

Abstract

In this paper, a highly sensitive gate/body-tied p-channel metal oxide semiconductor field effect transistor (PMOSFET)-type photodetector with an overlapping control gate is proposed. The proposed photodetector has an overlapping control gate that makes it possible to control the sensitivity of the proposed photodetector. This sensitivity controllability extends the dynamic range and provides a high sensitivity in a low-light environment. The body of the proposed gate/body-tied PMOSFET-type photodetector is connected to the floating gate, and the control gate is placed on top of the floating gate. The proposed device was fabricated using a 0.35 µm standard complementary metal oxide semiconductor (CMOS) process. The amplified photocurrent of the proposed device was more than 100 times larger than that of a conventional n+/p-sub photodiode with the same area. The area of the proposed photodetector is 3.8×4.4 µm2, which is 24% smaller than that of a conventional gate/body-tied PMOSFET-type photodetector with a transfer gate. Therefore, the proposed photodetector can be suitable for high-sensitivity active pixel sensors (APSs) because of its much higher responsivity than that of a conventional n+/p-sub photodiode.