Abstract

The integration of silicon waveguides with low-dimensional materials with excellent optoelectronic properties can enable compact and highly integrated optical devices with multiple advantages for multiple fields. A carbon nanotube (CNT) photodetector integrated on the silicon waveguide has the potential to meet on-chip high-speed optical interconnection systems, based on the outstanding properties of CNTs such as picosecond-level intrinsic photoresponse time, high charge carrier mobility, broad spectral response, high absorption coefficient, and so on. However, the thermal stability of the device may be compromised due to the local suspension in the channel for the height difference between the WG and the substrate. Here, we report a low-cost and low-optical-loss method to achieve the planarized silicon waveguide. After that, the CNT photodetectors integrated on the original and planarized waveguide with asymmetric palladium (Pd)-hafnium (Hf) metal contacts are fabricated. The influence of this planarization method on the performance of devices is analyzed via comparing the dark leakage current, the leakage current rectification ratio (CRR), the series resistances (R S ), and the photoelectric response. Finally, a CNT photodetector based on the planarized waveguide with a photocurrent (Iph) ∼510.84nA, a photoresponsivity (R I ) ∼51.04mA/W, the dark current ∼0.389µA, as well as a 3 dB bandwidth ∼34GHz at the large reverse voltage −3V is shown.

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