Abstract
AbstractUnder high power UV irradiation, radicals can be generated from double bonds through photodissociation, H‐abstraction, or oxygen initiation mechanisms. This eliminates the need for externally added initiators in photopolymerization. This study investigates high‐power sunlight‐simulated UV‐induced free radical polymerization under various experimental conditions, including the presence of inhibitors, open or closed systems, and partial degassing. Additionally, high‐power sunlight‐simulated UV‐induced atom transfer radical polymerization is explored by externally adding CuBr2/ligand (1:2) catalyst at 100 or 1000 ppm molar concentration of copper. Delicate fabrication of real‐world thin films, coatings, and delicate 3D composites further demonstrates the high reliability and versatility of this technology.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
