Abstract
Currently, there are few techniques that allow true 3D-printing on the nanoscale. The most promising candidate to fill this void is focused electron-beam-induced deposition (FEBID), a resist-free, nanofabrication compatible, direct-write method. The basic working principles of a computer-aided design (CAD) program (3BID) enabling 3D-FEBID is presented and simultaneously released for download. The 3BID capability significantly expands the currently limited toolbox for 3D-nanoprinting, providing access to geometries for optoelectronic, plasmonic, and nanomagnetic applications that were previously unattainable due to the lack of a suitable method for synthesis. The CAD approach supplants trial and error toward more precise/accurate FEBID required for real applications/device prototyping.
Highlights
Nanotechnology urgently requires methods for direct 3Dfabrication, both to access emergent materials properties derived from 3D-architectures[1−3] and potentially as an alternative strategy to in-plane miniaturization
The precursor is delivered to the substrate by vapor phase impingement using a capillary nozzle inserted near the beam impact region (BIR)
In order to illustrate the full power of the developed computer-aided design (CAD) software, we will discuss a series of real-world problems, which all 3D-focused electron-beam-induced deposition (FEBID) users may encounter
Summary
Nanotechnology urgently requires methods for direct 3Dfabrication, both to access emergent materials properties derived from 3D-architectures[1−3] and potentially as an alternative strategy to in-plane miniaturization. In situ chemical methods have emerged to ensure material purity in the final deposit, since organometallics used in FEBID often yield carbon composites, when metal or metal oxides are intended, because precursors had been initially engineered for thermal CVD.[10−14] Comprehensive surface science studies have recently provided new insights into precursor dissociation under electron irradiation.[15−22] Precursors tailored for FEBID are anticipated soon. As early as 20 years ago, the potential for 3Ddeposition was already recognized.[23−26] Complex 3D-nanostructures were fabricated by focused ion-beam-induced deposition (FIBID),[27−29] and a 3D-computer-aided design (CAD) environment for use with ions was even created.[30] Over the ensuing years, 3D-FEBID was demonstrated by Bret/ Utke,[31−33] Molhave,[34] Gazzadi,[35] and Matsui[36] (FIBID), providing the first realizations of controlled growth. Step-by-step methods are provided in the Supporting Information as PDFs and videos, comprehensively covering the use of the 3BID program
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