Abstract
A promising 3D nanoprinting method, used to deposit nanoscale mesh style objects, is prone to non-linear distortions which limits the complexity and variety of deposit geometries. The method, focused electron beam-induced deposition (FEBID), uses a nanoscale electron probe for continuous dissociation of surface adsorbed precursor molecules which drives highly localized deposition. Three dimensional objects are deposited using a 2D digital scanning pattern—the digital beam speed controls deposition into the third, or out-of-plane dimension. Multiple computer-aided design (CAD) programs exist for FEBID mesh object definition but rely on the definition of nodes and interconnecting linear nanowires. Thus, a method is needed to prevent non-linear/bending nanowires for accurate geometric synthesis. An analytical model is derived based on simulation results, calibrated using real experiments, to ensure linear nanowire deposition to compensate for implicit beam heating that takes place during FEBID. The model subsequently compensates and informs the exposure file containing the pixel-by-pixel scanning instructions, ensuring nanowire linearity by appropriately adjusting the patterning beam speeds. The derivation of the model is presented, based on a critical mass balance revealed by simulations and the strategy used to integrate the physics-based analytical model into an existing 3D nanoprinting CAD program is overviewed.
Highlights
Computer simulations are commonly employed to complement nanoscale synthesis as in situ characterization is often not practical
The presentation of the results focuses on the segment deposition, which takes place after pillar deposition, i.e., segment length (ST) > 500 nm
Surface deposit voxels contribute to the average and to contribute to this average, they must lie within a spherical volume, centered on each node, with a characteristic radius of 40 nm
Summary
Computer simulations are commonly employed to complement nanoscale synthesis as in situ characterization is often not practical. Time-dependent dynamics operative during synthesis are often unresolved and reconstruction of multiple ex situ characterization steps is necessary to try to infer time-varying progressions. Single experiment time-dependent behavior is only approximated using characterization results derived from multiple experiments, whether using (i) multiple process times, using the same sample, or (ii) using multiple samples with variable process times. Computer simulations can facilitate understanding the physical, chemical and temporal coordinates, supplementing experimental knowledge to predict deposition geometry. A simulation strategy is presented here that moves beyond simple geometric predictions, toward the integration of compensation strategies to avoid defects for enhanced nanoscale deposition precision. Simulation results, calibrated against real experiments, are used to construct an analytical
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