High breakdown voltage in AlN/GaN metal–insulator–semiconductor high-electron-mobility transistors

Abstract

The breakdown characteristics of AlGaN/GaN based metal–insulator–semiconductor high-electron-mobility transistors (MISHEMTs) using a 10 nm thick AlN gate insulator and passivation layer deposited plasma enhanced atomic layer deposition. The AlN was effective in significantly reducing gate leakage current relative to Schottky gate devices and showed only small decreases in drain current during gate lag measurements. The devices exhibited a strong dependence of gate breakdown voltage on source–drain distance, reaching a value of 2000 V for a source–drain distance of 40 μm limited by the measurement instrument. The specific on-state resistance was 1.3 and 10.9 mΩ cm2 for the devices with the gate–drain distance of 7.5 and 37.5 μm, respectively. The saturation drain current was inversely dependent on source–drain distance and the on–off ratios were in excess of 108 due to the low gate leakage current in the MISHEMTs.