Abstract

Polarization and breakdown strength as two sides of one coin are difficult to balance in one dielectric material, and so hierarchical heterostructure would be a good way to combine the advantages of each material enhancing energy density. In this work, high polarization Bi(Mg0.5Zr0.5)O3 (BMZ) and high breakdown strength Ba(Zr0.25Ti0.75)O3 (BZT) are chosen to prepare 1BMZ/4BZT/1BMZ (Type-A), 3BMZ/3BZT (Type-B) and 3(BMZ/BZT) (Type-C) hierarchical heterostructures thin films on Pt/Ti/SiO2/Si substrate via sol-gel method. Microstructure characteristics of thin films indicate that they possess well density, no crack and smooth surface. Thin films with Type-B structure possess a high dielectric constant of ∼500, which exceeds ∼150 of that with Type-A and Type-C structures. For energy storage properties, Type-B and Type-C thin films achieve high recoverable energy density Wrec of 85.6 J/cm3 and 85.7 J/cm3 at low field of 2545 kV/cm and high field of 4980 kV/cm, respectively. The design of hierarchical heterosrtucture would break the limitation of low energy density in single material, and provide a new thinking for the applications of dielectric energy storage materials.

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