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Open Accesshttps://doi.org/10.1039/d4nr04592k
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Cite Journal: Nanoscale |  Publication Date: Jan 1, 2025 |
 License type: cc-by |
Hf0.5Zr0.5O2/HfO2/Hf0.5Zr0.5O2 Laminated Thin Films and CF4 Plasma Passivation for Improved Memory and Synaptic Characteristics of Ferroelectric Field Effect Transistor
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