Abstract
To synthesize hydrogenated amorphous carbon (a‐C:H) films, filamentary dielectric discharge (FDBD) is used to improve their mechanical properties compared to the films synthesized by glow dielectric barrier discharge (GDBD), which is generally used for atmospheric pressure‐plasma‐enhanced chemical vapor deposition. The discharge form transitioned from GDBD to FDBD when the gap between the electrodes is increased from 1 to 4 mm. The hardness of the films increased from 3.7 to 11.9 GPa by using FDBD. The results indicate that hard a‐C:H films can be synthesized at room temperature by atmospheric pressure using FDBD.
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